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Optical Properties of Vacuum Evaporated WO3 Thin Films

Author Affiliations

  • 1Department of Physics, Andhra Loyola College, Vijayawada – 520008, INDIA
  • 2Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati – 517 502, INDIA

Res.J.chem.sci., Volume 1, Issue (7), Pages 76-80, October,18 (2011)

Abstract

Thin films of WO3 were prepared by vacuum evaporation technique in the temperature range 303-603 K. The deposition parameters such as substrate temperature, deposition rate, film –substrate combination, vacuum during the film deposition were controlled. The influence of substrate temperature on the optical properties of WO films has been studied in the wavelength range 300-1600 nm. The optical band gap is found to be dependent of the deposition temperature and decreased from 3.18 to 2.90 eV with increase of deposition temperature from 303 to 503 K. The effect of heat treatment in air (calcination) on the optical properties of the films is also reported.

References

  1. Arof A.K., Saniman E.B. and Mastor M.Z., Some properties of Agl-AgO-MoO3 electrolyte doped with Al J. Phys. III France, , 849-858 (1994)
  2. Granqvist C.G., Electrochromic tungsten oxide films: Review of progress 1993- 1998, Solar Energy Materials and Solar Cells,60, 201-262 (2003)
  3. Ashrit P.V., Bader G. and Truong V.V., Novel electrochromic devices based on complementary nanocrystallineTiO2 and WO3 thin films, Thin Solid Films, 320, 324-329 (1998)
  4. Woodward P.M., Sleight A.W. and Vogt T., Ferroelectric tungsten trioxide, J. Sol. State Chem.,131, 9-17 (1997)
  5. Antonaia A., Polichetti T., Addonizio M.L., Aprea S., Minarini C. and Rubino A., Modification of vapor-deposited WO3 electrochromic films by oxygen backfilling, Thin Solid Films,354, 73-81 (1999)
  6. Joraid A.A. and Almari S.N., Effect of annealing on structural and optical properties of WO thin films prepared by electron-beam coating, Physica B: Physics of Condensed Matter,391, 199-205 (2007)
  7. Tagtstrom P. and Jansson U., Chemical vapour deposition of epitaxial WO films, Thin Solid Films, 352, 107-113 (1999)
  8. Hussain O.M., Swapnasmitha A. S., John J. and Pinto R., Structure and morphology of laser-ablated WOthin films, Appl. Phys. A, 81, 1291-1297(2005)
  9. Ottaviano L., Rossi M. and Santucci S., Initial stages of WO growth on silicon substrates, Thin Solid Films,490,59-67 (2005)
  10. Rao M.C., Effect of substrate temperature on the structural and electrical conduction behaviour of vacuum evaporated WO3 thin films, J. Optoelect. & Biomedical Mater., 3,45-50 (2011)
  11. Miyake K., Kaneko H., Sano M. and Suedomi N.,Physical and electrochromic properties of the amorphous and crystalline tungsten oxide thick films prepared under reducing atmosphere, J. Appl. Phys., 55, 2747-2753 (1984)