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Characterization of the Background Plasma in a Compact Plasma System

Author Affiliations

  • 1Department of Physics, Christ College, Cuttack-753003, Odisha, INDIA
  • 2Department of Physics, Ravenshaw University, Cuttack-753001, Odisha, INDIA
  • 3Institute for Plasma Resaerch, Bhat, Gandhinagar, Gujarat-382428, INDIA

Res. J. Physical Sci., Volume 3, Issue (6), Pages 10-15, August,4 (2015)


A new set up to create background plasma in Compact Plasma System is reported in this communication. The new set up creates back ground plasma having plasma density ~ 1.154 X 1013 m-3 and electron temperature ~ 1.45 eV for input power 7.5 W at a distance 3 cm from cathode. The local plasma density and electron temperature are estimated using double probe technique. Line averaged electron temperature measured using emission spectroscopy signature is ~ 1.58 eV for similar conditions. Imaging experiments shows that the background plasma created in this set up is large enough to interact with the bulk plasma(creating ‘blobs’) produced from gas injected washer plasma gun.


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